Trimethoxyphenylsilane (CAS No. 2996-92-1) is a versatile silane coupling agent that can be used to improve the adhesion of a variety of materials. It is a clear, colorless liquid that is soluble in most organic solvents. Trimethoxyphenylsilane is typically used as a 1-2% solution in an organic solvent.
Trimethoxyphenylsilane works by forming a covalent bond with the surface of the material being bonded. This bond is much stronger than the van der Waals forces that hold together most materials. As a result, trimethoxyphenylsilane can significantly improve the adhesion of a variety of materials.
Trimethoxyphenylsilane is used in a variety of applications, including:
- Coatings: Trimethoxyphenylsilane is used to improve the adhesion of coatings to a variety of substrates, including metals, plastics, and ceramics. This can help to improve the durability and performance of the coating.
- Adhesives: Trimethoxyphenylsilane is used to improve the adhesion of adhesives to a variety of substrates. This can help to improve the strength and performance of the adhesive joint.
- Sealants: Trimethoxyphenylsilane is used to improve the adhesion of sealants to a variety of substrates. This can help to improve the watertightness and durability of the sealant.
Trimethoxyphenylsilane is a safe and effective silane coupling agent that can be used to improve the adhesion of a variety of materials. It is a versatile product that can be used in a variety of applications.
- Trimethoxyphenylsilane is a clear, colorless liquid that is soluble in most organic solvents.
- Trimethoxyphenylsilane is typically used as a 1-2% solution in an organic solvent.
- Trimethoxyphenylsilane works by forming a covalent bond with the surface of the material being bonded.
- Trimethoxyphenylsilane is used in a variety of applications, including coatings, adhesives, and sealants.
- Trimethoxyphenylsilane is a safe and effective silane coupling agent.
|Physical and chemical properties|
Features and uses :
Phenyltrimethoxysilane is a single molecule chemical that reacts with water to form silanols and methanol. After hydrolysis, reactive silanols are formed which can condense with other silanol groups (eg silanol groups on the surface of silica fillers) to form siloxane chains.
Siloxane condensation products can be formed stably on other oxides such as aluminum, zirconium, tin, titanium, and nickel, and are relatively stable with oxides of boron, iron, and carbon, and cannot be formed on the surface of alkali metal oxides and carbonates. Moisture in the air or on the substrate surface may be sufficient to ensure hydrolysis, but in some cases it may be necessary to add water to increase the degree of hydrolysis.
Packaging and storage :
The finished products are packed in 5KG, 25KG, 200KG plastic barrels, and other specifications need to be ordered.
Trimethoxyphenylsilane (TMPS) is an organotrialkoxysilane with the chemical formula (CH₃O)₃SiC₆H₅ and the CAS number 2996-92-1. It is a clear liquid with a boiling point of 233 °C and a density of 1.062 g/mL. It is also known as (trimethoxysilyl)benzene or phenyltrimethoxysilane.
TMPS is used as a functional monomer in the sol-gel processing of various materials³ . Sol-gel processing is a method of synthesizing solid materials from liquid precursors by hydrolysis and condensation reactions. TMPS can react with water or other alcohols to form silanols, which can further condense to form siloxane bonds. These bonds can link TMPS molecules together or with other organic or inorganic components, forming hybrid networks with different properties.
Some of the applications of TMPS in sol-gel processing are:
- Preparation of mesoporous silica with phenyl groups, which can be used as catalysts, adsorbents, sensors, or drug delivery systems.
- Preparation of molecularly imprinted sol-gels for the detection of specific analytes by localized surface plasmon resonance (LSPR). LSPR is a phenomenon where metal nanoparticles exhibit strong optical absorption or scattering when irradiated by light at a certain wavelength. Molecularly imprinted sol-gels are materials that have specific binding sites for target molecules, which can alter the LSPR response of the metal nanoparticles embedded in them.
- Preparation of polytrimethoxyphenylsilane (PTMS), which can facilitate the removal of graphene after chemical vapor deposition (CVD). CVD is a technique of depositing thin films of materials on substrates by exposing them to gaseous precursors. Graphene is a two-dimensional material composed of a single layer of carbon atoms arranged in a hexagonal lattice. It has remarkable electrical, mechanical, and thermal properties, but it is difficult to transfer from the substrate to other devices. PTMS can act as a sacrificial layer that can be dissolved by acid, leaving behind the graphene film.
TMPS is a versatile organosilicon reagent that can be used to synthesize various materials with different properties and applications. It is available from several suppliers, such as Merck, Sigma-Aldrich, and Pengrun Ltd for synthesis purposes.